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dc.contributor.authorWhittaker, Jed D.
dc.contributor.authorBrink, Markus
dc.contributor.authorHusseini, Ghaleb
dc.contributor.authorLinford, Matthew R.
dc.contributor.authorDavis, Robert C.
dc.date.accessioned2021-01-13T07:41:40Z
dc.date.available2021-01-13T07:41:40Z
dc.date.issued2003
dc.identifier.citationSelf-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition, Jed D. Whittaker, Markus Brink ,Ghaleb A. Husseini and Matthew R. Linford, Robert C. Davis, Applied Physics Letters, 83, 5307-5309 (2003) https://doi.org/10.1063/1.1636267en_US
dc.identifier.issn1077-3118
dc.identifier.urihttp://hdl.handle.net/11073/20685
dc.description.abstractA self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO2 trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO2 CVD. No film was deposited on the nanotubes where they were suspended across the trenches.en_US
dc.description.sponsorshipCollege of Engineeringen_US
dc.description.sponsorshipDepartment of Chemical Engineeringen_US
dc.language.isoen_USen_US
dc.publisherAmerican Institute of Physics (AIP)en_US
dc.relation.ispartofseriesAmerican University of Sharjah Faculty Worken_US
dc.relation.urihttps://doi.org/10.1063/1.1636267en_US
dc.subjectMetal oxidesen_US
dc.subjectSilicatesen_US
dc.subjectChemical vapor depositionen_US
dc.subjectChemical elementsen_US
dc.subjectThin film depositionen_US
dc.subjectNanotubesen_US
dc.titleSelf-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor depositionen_US
dc.typePeer-Revieweden_US
dc.typeArticleen_US
dc.typePublished versionen_US
dc.identifier.doi10.1063/1.1636267


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