Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated 3-Glycidoxypropyldimethylethoxysilane Analyzed by XPS

Abstract

Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of 3-glycidoxypropyldimethylethoxysilane (CAS# 17963-04-1) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 100 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required.