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Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS
(American Vacuum Society, 2012)
Monolayers of trichloro(lH,1H,2H,2H-perfluorooctyl)silane, Cl3SiCH2CH2(CF2)5CF3, were deposited via chemical vapor deposition onto the native oxide layer on silicon after plasma-cleaning. The samples have high hydrophobicity, ...