Alkyl Monolayers on Silica Surfaces Prepared Using Neat, Heated Dimethylmonochlorosilanes with Low Vapor Pressures
dc.contributor.author | Husseini, Ghaleb | |
dc.contributor.author | Peacock, Justin G. | |
dc.contributor.author | Sathyapalan, Amarchand | |
dc.contributor.author | Zilch, Lloyd W. | |
dc.contributor.author | Asplund, Matthew C. | |
dc.contributor.author | Sevy, Eric T. | |
dc.contributor.author | Linford, Matthew R. | |
dc.date.accessioned | 2021-01-04T08:14:52Z | |
dc.date.available | 2021-01-04T08:14:52Z | |
dc.date.issued | 2003 | |
dc.identifier.citation | Husseini, G. A., Peacock, J., Sathyapalan, A., Zilch, L. W., Asplund, M. C., Sevy, E. T., & Linford, M. R. (2003). Alkyl Monolayers on Silica Surfaces Prepared Using Neat, Heated Dimethylmonochlorosilanes with Low Vapor Pressures. Langmuir, 19(12), 5169–5171. https://doi.org/10.1021/la020986l | en_US |
dc.identifier.issn | 1520-5827 | |
dc.identifier.uri | http://hdl.handle.net/11073/19837 | |
dc.language.iso | en_US | en_US |
dc.publisher | American Chemical Society | en_US |
dc.relation.uri | https://doi.org/10.1021/la020986l | en_US |
dc.subject | Group 14 compounds | en_US |
dc.subject | Inorganic compounds | en_US |
dc.subject | Monolayers | en_US |
dc.subject | Silicon | en_US |
dc.subject | X-ray photoelectron spectroscopy | en_US |
dc.title | Alkyl Monolayers on Silica Surfaces Prepared Using Neat, Heated Dimethylmonochlorosilanes with Low Vapor Pressures | en_US |
dc.type | Peer-Reviewed | en_US |
dc.type | Article | en_US |
dc.type | Postprint | en_US |
dc.identifier.doi | 10.1021/la020986l |