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    Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated (Tridecafluoro-1,1,2,2-tetrahydrooctyl)-1- dimethylchlorosilane Analyzed by XPS

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    Date
    2004
    Author
    Husseini, Ghaleb
    Sevy, Eric T.
    Asplund, Matthew C.
    Peacock, Justin G.
    Linford, Matthew R.
    Advisor(s)
    Unknown advisor
    Type
    Peer-Reviewed
    Article
    Published version
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    Abstract
    Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of (Tridecafluoro-1,1,2,2-tetrahydrooctyl)- 1-dimethylchlorosilane on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 60 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required.
    DSpace URI
    http://hdl.handle.net/11073/21333
    External URI
    https://doi.org/10.1116/11.20020802
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