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dc.contributor.authorHusseini, Ghaleb
dc.contributor.authorNiederhauser, Travis L.
dc.contributor.authorPeacock, Justin G.
dc.contributor.authorVernon, M. R.
dc.contributor.authorLua, Yit-Yian
dc.contributor.authorAsplund, Matthew C.
dc.contributor.authorSevy, Eric T.
dc.contributor.authorLinford, Matthew R.
dc.date.accessioned2021-01-04T07:36:26Z
dc.date.available2021-01-04T07:36:26Z
dc.date.issued2003
dc.identifier.citationHusseini, G. A., Niederhauser, T. L., Peacock, J. G., Vernon, M. R., Lua, Y.-Y., Asplund, M. C., Sevy, E. T., & Linford, M. R. (2003). Photochemical Lithography: Creation of Patterned, Acid Chloride Functionalized Surfaces Using UV Light and Gas-Phase Oxalyl Chloride. Langmuir, 19(11), 4856–4858. https://doi.org/10.1021/la020896gen_US
dc.identifier.issn1520-5827
dc.identifier.urihttp://hdl.handle.net/11073/19836
dc.description.sponsorshipCollege of Engineeringen_US
dc.description.sponsorshipDepartment of Chemical Engineeringen_US
dc.language.isoen_USen_US
dc.publisherAmerican Chemical Societyen_US
dc.relation.ispartofseriesAmerican University of Sharjah Faculty Worken_US
dc.relation.urihttps://doi.org/10.1021/la020896gen_US
dc.subjectFunctionalizationen_US
dc.subjectAnionsen_US
dc.subjectCarbonen_US
dc.subjectMonolayersen_US
dc.subjectAlkylsen_US
dc.titlePhotochemical Lithography: Creation of Patterned, Acid Chloride Functionalized Surfaces Using UV Light and Gas-Phase Oxalyl Chlorideen_US
dc.typePeer-Revieweden_US
dc.typeArticleen_US
dc.typePostprinten_US
dc.identifier.doi10.1021/la020896g


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