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dc.contributor.authorHusseini, Ghaleb
dc.contributor.authorPeacock, Justin G.
dc.contributor.authorSathyapalan, Amarchand
dc.contributor.authorZilch, Lloyd W.
dc.contributor.authorAsplund, Matthew C.
dc.contributor.authorSevy, Eric T.
dc.contributor.authorLinford, Matthew R.
dc.date.accessioned2021-01-04T08:14:52Z
dc.date.available2021-01-04T08:14:52Z
dc.date.issued2003
dc.identifier.citationHusseini, G. A., Peacock, J., Sathyapalan, A., Zilch, L. W., Asplund, M. C., Sevy, E. T., & Linford, M. R. (2003). Alkyl Monolayers on Silica Surfaces Prepared Using Neat, Heated Dimethylmonochlorosilanes with Low Vapor Pressures. Langmuir, 19(12), 5169–5171. https://doi.org/10.1021/la020986len_US
dc.identifier.issn1520-5827
dc.identifier.urihttp://hdl.handle.net/11073/19837
dc.description.sponsorshipCollege of Engineeringen_US
dc.description.sponsorshipDepartment of Chemical Engineeringen_US
dc.language.isoen_USen_US
dc.publisherAmerican Chemical Societyen_US
dc.relation.ispartofseriesAmerican University of Sharjah Faculty Worken_US
dc.relation.urihttps://doi.org/10.1021/la020986len_US
dc.subjectGroup 14 compoundsen_US
dc.subjectInorganic compoundsen_US
dc.subjectMonolayersen_US
dc.subjectSiliconen_US
dc.subjectX-ray photoelectron spectroscopyen_US
dc.titleAlkyl Monolayers on Silica Surfaces Prepared Using Neat, Heated Dimethylmonochlorosilanes with Low Vapor Pressuresen_US
dc.typePeer-Revieweden_US
dc.typeArticleen_US
dc.typePostprinten_US
dc.identifier.doi10.1021/la020986l


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