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    Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition

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    10carbonnanotubes(APL).pdf (336.7Kb)
    Date
    2003
    Author
    Whittaker, Jed D.
    Brink, Markus
    Husseini, Ghaleb
    Linford, Matthew R.
    Davis, Robert C.
    Advisor(s)
    Unknown advisor
    Type
    Peer-Reviewed
    Article
    Published version
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    Abstract
    A self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO2 trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO2 CVD. No film was deposited on the nanotubes where they were suspended across the trenches.
    DSpace URI
    http://hdl.handle.net/11073/20685
    External URI
    https://doi.org/10.1063/1.1636267
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